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Challenges and confusions in the kinetics and mechanism of plasma induced deposition of a- and μc-Ge:H

Challenges and confusions in the kinetics and mechanism of plasma induced deposition of a- and μc-Ge:H

S. Vepřek; F. Glatz; R. Konwitschny

作者S. Vepřek; F. Glatz; R. Konwitschny
印刷ISSN0022-3093
文件大小291.74KB
发表时间1991
DOI10.1016/s0022-3093(05)80236-4

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