Effect of oxide resistance on the characterization of interface trap density in MOS structures
- 作者Jing-Jenn Lin; Jenn-Gwo Hwu
- 卷第34卷
- 期第12期
- 印刷ISSN0038-1101
- 文件大小450.97KB
- 发表时间1991
- DOI10.1016/0038-1101(91)90043-x
- 页码1449-1454
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