7405. Electron trapping characterization by Auger electron spectroscopy in silicon oxynitride thin film: A J de Castro et al, J Vac Sci Technol, A8, 1990, 2236–2240

• 卷第42卷
• 印刷ISSN0042-207X
• 文件大小149.72KB
• 发表时间1991
• DOI10.1016/0042-207x(91)91212-7