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Determination of V/III ratios on phosphide surfaces during gas source molecular beam epitaxy

Determination of V/III ratios on phosphide surfaces during gas source molecular beam epitaxy

Chin, T. P.; Liang, B. W.; Hou, H. Q.; Ho, M. C.; Chang, C. E.; Tu, C. W.

期刊名称Applied Physics Letters
作者Chin, T. P.; Liang, B. W.; Hou, H. Q.; Ho, M. C.; Chang, C. E.; Tu, C. W.
卷第58卷
期第3期
印刷ISSN0003-6951
文件大小641.93KB
发表时间1991
DOI10.1063/1.104706

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