Amorphization processes in self-ion-implanted Si: Dose dependence
- 期刊名称Applied Physics Letters
- 作者Motooka, T.; Holland, O. W.
- 卷第58卷
- 期第21期
- 印刷ISSN0003-6951
- 文件大小728.64KB
- 发表时间1991
- DOI10.1063/1.104871
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