Suppression of nucleation during crystallization of amorphous thin Si films
Im, James S.; Shin, Jung H.; Atwater, Harry A.
- 期刊名称Applied Physics Letters
- 作者Im, James S.; Shin, Jung H.; Atwater, Harry A.
- 卷第59卷
- 期第18期
- 印刷ISSN0003-6951
- 文件大小688.98KB
- 发表时间1991
- DOI10.1063/1.106054