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SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - <title>Novolak design for high-resolution positive photoresists (IV): tandem-type novolak resin for high-performance positive photoresists</title>

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Novolak design for high-resolution positive photoresists (IV): tandem-type novolak resin for high-performance positive photoresists

Hanabata, Makoto; Oi, F.; Furuta, Akihiro; Ito, Hiroshi

作者Hanabata, Makoto; Oi, F.; Furuta, Akihiro; Ito, Hiroshi
卷第1466卷
印刷ISSN0277-786X
文件大小771.54KB
发表时间1991
DOI10.1117/12.46364
页码132-140

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