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Phase-Change Optical Disks with High Writing Sensitivity Using a-SiN:H Protective Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Phase-Change Optical Disks with High Writing Sensitivity Using a-SiN:H Protective Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Y. Sugiyama; H. Yamazaki; S. Fujimori; I. Hatakeyama

作者Y. Sugiyama; H. Yamazaki; S. Fujimori; I. Hatakeyama
文件大小1061.48KB
发表时间1991
DOI10.1143/JJAP.30.1731

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