Diffusion Barrier Effect of Ultra-Thin Photo-Nitrided a-Si:H Overlayer on SnO 2 /Glass Substrate
- 期刊名称Japanese Journal of Applied Physics
- 作者Kawabata, Keishi; Shiratsuki, Yoshiyuki; Hayashi, Tsukasa; Yamada, Keichi; Miyazaki, Seiichi; Hirose, Masataka
- 卷第30卷
- 印刷ISSN0021-4922
- 文件大小549.51KB
- 发表时间1991-7-15
- DOI10.1143/JJAP.30.L1231
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