Residual Stress Measurement in Silicon Substrate After Local Thermal Oxidation Using Microscopic Raman Spectroscopy
- 期刊名称MRS Proceedings
- 作者Miura, Hideo; Sakata, Hiroshi; Merl, Shinji Sakata
- 卷第226卷
- 电子ISSN1946-4274
- 文件大小1864.38KB
- 发表时间1991-1
- DOI10.1557/proc-226-345
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