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The Laplacian of the charge density as a probe of reaction paths and reactivity: a comparison of SN2 reactions at carbon and silicon

The Laplacian of the charge density as a probe of reaction paths and reactivity: a comparison of SN2 reactions at carbon and silicon

Shi, Zheng; Boyd, Russell J.

期刊名称The Journal of Physical Chemistry
作者Shi, Zheng; Boyd, Russell J.
卷第95卷
期第12期
印刷ISSN0022-3654
电子ISSN1541-5740
文件大小520.65KB
发表时间1991-06
DOI10.1021/j100165a020
页码4698-4701

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