Novel Doping Process for Ultra-Shallow Junction: Rapid Vapor-Phase Direct Doping (RVD)
- 期刊名称MRS Proceedings
- 作者Kiyota, Yukihiro; Onai, Takahiro; Nakamura, Tohru; Inada, Taroh; Kuranouchi, Atsushi; Hirano, Yasuaki
- 卷第259卷
- 电子ISSN1946-4274
- 文件大小875.73KB
- 发表时间1992-1
- DOI10.1557/PROC-259-493
Fine Chemicals through Heterogeneous Catalysis (Sheldon/Fine) || FrontmatterSheldon, Roger Arthur; van Bekkum, Herman · 2000
Fine Chemicals through Heterogeneous Catalysis (Sheldon/Fine) || IndexSheldon, Roger Arthur; van Bekkum, Herman · 2000
Fine Chemicals through Heterogeneous Catalysis (Sheldon/Fine) || IntroductionSheldon, Roger Arthur; van Bekkum, Herman · 2000
Fine Chemicals through Heterogeneous Catalysis (Sheldon/Fine) || Future OutlookSheldon, Roger Arthur; van Bekkum, Herman · 2000
Fine Chemicals through Heterogeneous Catalysis (Sheldon/Fine) || Basic Principles/GeneralSheldon, Roger Arthur; van Bekkum, Herman · 2000
Fine Chemicals through Heterogeneous Catalysis (Sheldon/Fine) || Catalytic Hydrogenation and DehydrogenationSheldon, Roger Arthur; van Bekkum, Herman · 2000
Fine Chemicals through Heterogeneous Catalysis (Sheldon/Fine) || Solid-base CatalysisSheldon, Roger Arthur; van Bekkum, Herman · 2000