Study of gate oxide damage in an electron cyclotron resonance argon plasma
- 期刊名称Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- 作者Felch, S. B.
- 卷第10卷
- 期第4期
- 印刷ISSN0734-211X
- 文件大小513.75KB
- 发表时间1992-7
- DOI10.1116/1.585861
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