Stress Relaxation in SiO[sub 2] Films on Silicon by a Negative Point Oxygen Corona Discharge
- 期刊名称Journal of The Electrochemical Society
- 作者Landsberger, L. M.
- 卷第139卷
- 期第1期
- 印刷ISSN0013-4651
- 文件大小1287.76KB
- 发表时间1992
- DOI10.1149/1.2069173
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