Phosphine Doping Effects in the Plasma Deposition of Polycrystalline Silicon Films
Kakinuma, Hiroaki; Mohri, Mikio; Tsuruoka, Taiji
- 期刊名称Japanese Journal of Applied Physics
- 作者Kakinuma, Hiroaki; Mohri, Mikio; Tsuruoka, Taiji
- 卷第31卷
- 印刷ISSN0021-4922
- 文件大小915.00KB
- 发表时间1992-10-1
- DOI10.1143/JJAP.31.L1392