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Phosphine Doping Effects in the Plasma Deposition of Polycrystalline Silicon Films

Phosphine Doping Effects in the Plasma Deposition of Polycrystalline Silicon Films

Kakinuma, Hiroaki; Mohri, Mikio; Tsuruoka, Taiji
  • 期刊名称Japanese Journal of Applied Physics
  • 作者Kakinuma, Hiroaki; Mohri, Mikio; Tsuruoka, Taiji
  • 卷第31卷
  • 印刷ISSN0021-4922
  • 文件大小915.00KB
  • 发表时间1992-10-1
  • DOI10.1143/JJAP.31.L1392
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