Toward Epitaxial Growth of CuGaS 2 on GaAs(001) Substrate by Chloride Chemical Vapor Deposition
- 期刊名称Japanese Journal of Applied Physics
- 作者Pu, Yong Shen; Kato, Takamasa; Matsumoto, Takashi
- 卷第31卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小944.69KB
- 发表时间1992-10-15
- DOI10.1143/JJAP.31.3420
- 页码3420-3421
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