Absorption Coefficient and Sensitivity of Positive and Negative Resists in the Vacuum Ultraviolet Region
- 期刊名称Japanese Journal of Applied Physics
- 作者Kudo, Kazuhiro; Miyazaki, Kenzo; Sakai, Hirofumi; Iwabuchi, Takashi; Mutoh, Katsuhiko; Miyata, Takeo; Tomiki, Tetsuhiko
- 卷第31卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小289.12KB
- 发表时间1992-2-15
- DOI10.1143/JJAP.31.401
- 页码401-404
Spectral Emissivity of SiliconSatō, Tsutomu · Japanese Journal of Applied Physics · 1967
Surface Acoustic Wave SensorsShiokawa, Showko; Kondoh, Jun · Japanese Journal of Applied Physics · 2004
Perspectives in SonochemistryAndo, Takashi; Kimura, Takahide · Japanese Journal of Applied Physics · 2003
Structurally Stable Hyperbolic BeamChakraborty, Rijuparna; Ghosh, Ajay · Japanese Journal of Applied Physics · 2009
Peierls Phase TransitionKagoshima, Seiichi · Japanese Journal of Applied Physics · 1981
Piezoelectric Tensor of KNbO <sub/>3</sub>Günter, P. · Japanese Journal of Applied Physics · 1977
Plasma Anodic Oxidation of InPFuyuki, Takashi; Moriuchi, Sohta; Matsunami, Hiroyuki · Japanese Journal of Applied Physics · 1983
Linearity Characteristics of Multiplier PhototubesNonaka, Mamoru; Kashima, Takeo · Japanese Journal of Applied Physics · 1963