Uniform Electron Cyclotron Resonance Plasma Generation for Precise ULSI Patterning
- 期刊名称Japanese Journal of Applied Physics
- 作者Samukawa, Seiji; Nakamura, Tsuyoshi; Ishida, Toshinori; Ishitani, Akihiko
- 卷第31卷
- 印刷ISSN0021-4922
- 文件大小2764.21KB
- 发表时间1992-6-15
- DOI10.1143/JJAP.31.L774
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