Novolak design concept for high performance positive photoresists
Makoto Hanabata; Fumio Oi; Akihiro Furuta
- 作者Makoto Hanabata; Fumio Oi; Akihiro Furuta
- 卷第32卷
- 期第20期
- 印刷ISSN0032-3888
- 电子ISSN1548-2634
- 文件大小431.32KB
- 发表时间1992
- DOI10.1002/pen.760322009
- 页码1494-1499