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SPIE Proceedings [SPIE Dry Etch Technology - San J, United States (Monday 9 September 1991)] Dry Etch Technology - <title>Relationship between DUV lithography and etch for pattern transfer</title>

SPIE Proceedings [SPIE Dry Etch Technology - San J, United States (Monday 9 September 1991)] Dry Etch Technology - Relationship between DUV lithography and etch for pattern transfer

Witowski, Joyce Z.; Capsuto, Elliott S.; Sethi, Satyendra S.; Kochan, John; Ranadive, Deepak
  • 作者Witowski, Joyce Z.; Capsuto, Elliott S.; Sethi, Satyendra S.; Kochan, John; Ranadive, Deepak
  • 卷第1593卷
  • 印刷ISSN0277-786X
  • 文件大小2514.19KB
  • 发表时间1992
  • DOI10.1117/12.56928
  • 页码105-117
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