SPIE Proceedings [SPIE Dry Etch Technology - San J, United States (Monday 9 September 1991)] Dry Etch Technology - How to etch the optimal silicon trench: profile development and process discussion
- 作者Pilz, Wolfgang; Graendorff, K.; Janes, Joachim; Pelka, Joachim; Ranadive, Deepak
- 卷第1593卷
- 印刷ISSN0277-786X
- 文件大小595.08KB
- 发表时间1992
- DOI10.1117/12.56931
- 页码178-185
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