SPIE Proceedings [SPIE Dry Etch Technology - San J, United States (Monday 9 September 1991)] Dry Etch Technology - Application-specific integrated processing for ULSI
- 作者Nulty, James E.; Maher, Joseph A.; Ranadive, Deepak
- 卷第1593卷
- 印刷ISSN0277-786X
- 文件大小548.55KB
- 发表时间1992
- DOI10.1117/12.56920
- 页码137-144
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