SPIE Proceedings [SPIE Dry Etch Technology - San J, United States (Monday 9 September 1991)] Dry Etch Technology - Consideration on the resolution limit of the resist silylated process
- 作者Tanimoto, Keisuke; Komeda, Hiroyuki; Takehara, Daisuke; Kawabata, Ryohei; Shibayama, Hikou; Ranadive, Deepak
- 卷第1593卷
- 印刷ISSN0277-786X
- 文件大小824.88KB
- 发表时间1992
- DOI10.1117/12.56915
- 页码56-66
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