SPIE Proceedings [SPIE Dry Etch Technology - San J, United States (Monday 9 September 1991)] Dry Etch Technology - Evaluation of silicon surface damage induced by plasma radiation

Yoneda, Masahiro; Kawai, K.; Miyatake, Hiroshi; Fujiwara, Nobuo; Nishioka, K.; Abe, Haruhiko; Ranadive, Deepak

作者Yoneda, Masahiro; Kawai, K.; Miyatake, Hiroshi; Fujiwara, Nobuo; Nishioka, K.; Abe, Haruhiko; Ranadive, Deepak
卷第1593卷
印刷ISSN0277-786X
文件大小360.41KB
发表时间1992
DOI10.1117/12.56910
页码2-10

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