Effects of a stress field on boron ion implantation damage in silicon
- 期刊名称Journal of Applied Physics
- 作者Mis, J. D.; Mader, S. R.; Beshers, D. N.
- 卷第74卷
- 期第4期
- 印刷ISSN0021-8979
- 文件大小1092.83KB
- 发表时间1993
- DOI10.1063/1.354713
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