Metalorganic Chemical Vapor Deposition of Aluminum-Copper Alloy Films
- 期刊名称Japanese Journal of Applied Physics
- 作者Katagiri, Tomoharu; Kondoh, Eiichi; Takeyasu, Nobuyuki; Nakano, Tadashi; Yamamoto, Hiroshi; Ohta, Tomohiro
- 卷第32卷
- 印刷ISSN0021-4922
- 文件大小310.59KB
- 发表时间1993-8-1
- DOI10.1143/JJAP.32.L1078
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