Model for Al Etch-Rate Enhancement at Low Temperatures
- 期刊名称Japanese Journal of Applied Physics
- 作者Uchida, Takashi; Aoki, Hidemitsu; Hane, Masami; Hasegawa, Shinya; Ikawa, Eiji
- 卷第32卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小1080.29KB
- 发表时间1993-12-30
- DOI10.1143/JJAP.32.6095
- 页码6095-6101
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