Ion Irradiated Amorphous Silicon: A Model Approach to Dynamics of Defect Creation and Annihilation
- 期刊名称MRS Proceedings
- 作者Shin, Jung H.; Atwater, Harry A.
- 卷第311卷
- 电子ISSN1946-4274
- 文件大小339.22KB
- 发表时间1993-1
- DOI10.1557/proc-311-221
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