![Development of Optical Coatings for 157-nm Lithography. I. Coating Materials]()
Development of Optical Coatings for 157-nm Lithography. I. Coating MaterialsNiisaka, Shunsuke; Saito, Tadahiko; Saito, Jun; Tanaka, Akira; Matsumoto, Akira; Otani, Minoru; Biro, Ryuji; Ouchi, Chidane; Hasegawa, Masanobu; Suzuki, Yasuyuki · ao/41/16/ao-41-16-3242.pdf · 2002