SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III - Suppression of resist heating effect by multiple electron-beam exposure on GaAs substrates
- 作者Minami, Hiroyuki; Nakano, Hirofumi; Sato, Kazuhiko; Takano, Hirozo; Patterson, David O.
- 卷第1924卷
- 印刷ISSN0277-786X
- 文件大小346.98KB
- 发表时间1993
- DOI10.1117/12.146506
- 页码204-213
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