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Positive chemically amplified resists using naphthoquinone diazides as photo-acid-generators.

Hayase, Rumiko; Onishi, Yasunobu; Niki, Hirokazu; Oyasato, Naohiko; Hayase, Shuzi

期刊名称Journal of Photopolymer Science and Technology
作者Hayase, Rumiko; Onishi, Yasunobu; Niki, Hirokazu; Oyasato, Naohiko; Hayase, Shuzi
卷第6卷
期第4期
印刷ISSN0914-9244
电子ISSN1349-6336
文件大小110.60KB
发表时间1993
DOI10.2494/photopolymer.6.495
页码495-496