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Fabrication of high performance 512Kb SRAMs in 0.25 μm CMOS technology using x-ray lithography

R. Viswanathan; D. Seeger; A. Bright; T. Bucelot; A. Pomerene; K. Petrillo; P. Blauner; P. Agnello; J. Warlaumont; J. Conway; D. Patel

作者R. Viswanathan; D. Seeger; A. Bright; T. Bucelot; A. Pomerene; K. Petrillo; P. Blauner; P. Agnello; J. Warlaumont; J. Conway; D. Patel
卷第23卷
印刷ISSN0167-9317
文件大小484.69KB
发表时间1994
DOI10.1016/0167-9317(94)90148-1
页码247-252