Wavelength dependence of exposure window and resist profile in x-ray lithography

• 期刊名称Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• 作者Guo, Jerry Z. Y.
• 卷第12卷
• 期第6期
• 印刷ISSN0734-211X
• 文件大小750.15KB
• 发表时间1994-11
• DOI10.1116/1.587427