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Charge-defect thermodynamic equilibrium and ‘‘metastable’’ defects in amorphous silicon

Charge-defect thermodynamic equilibrium and ‘‘metastable’’ defects in amorphous silicon

Fortmann, C. M.; Dawson, R. M.; Liu, H. Y.; Wronski, C. R.
  • 期刊名称Journal of Applied Physics
  • 作者Fortmann, C. M.; Dawson, R. M.; Liu, H. Y.; Wronski, C. R.
  • 卷第76卷
  • 期第2期
  • 印刷ISSN0021-8979
  • 文件大小865.84KB
  • 发表时间1994
  • DOI10.1063/1.357779
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