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Effects of N2 Plasma Treatment on SiO2 Gate Insulator in a-Si:H Thin Film Transistor

Kim, Sung Chul; Bae, Sung Sig; Oh, Eui Yeol; Kim, Jeong Hyun; Lee, Jong Wan; Kim, Cha Yeon; Kim, Donggil

期刊名称MRS Proceedings
作者Kim, Sung Chul; Bae, Sung Sig; Oh, Eui Yeol; Kim, Jeong Hyun; Lee, Jong Wan; Kim, Cha Yeon; Kim, Donggil
卷第345卷
电子ISSN1946-4274
文件大小328.23KB
发表时间1994-1
DOI10.1557/proc-345-29