SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Dissolution characteristics optimization for chemically amplified positive resist
- 作者Itani, Toshiro; Iwasaki, Haruo; Fujimoto, Masashi; Kasama, Kunihiko; Nalamasu, Omkaram
- 卷第2195卷
- 印刷ISSN0277-786X
- 文件大小416.71KB
- 发表时间1994
- DOI10.1117/12.175330
- 页码126-136