SPIE Proceedings [SPIE Microelectronic Manufacturing - Austin, TX (Tuesday 18 October 1994)] Microelectronics Technology and Process Integration - Model for the growth of oxides in N<sub>2</sub>O
- 作者Dimitrijev, Sima; Harrison, H. Barry; Sweatman, Denis R.; Chen, Fusen E.; Murarka, Shyam P.
- 卷第2335卷
- 印刷ISSN0277-786X
- 文件大小645.77KB
- 发表时间1994
- DOI10.1117/12.186066
- 页码271-281
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