Effects of hydrostatic pressure on dopant diffusion in silicon
- 期刊名称Journal of Applied Physics
- 作者Park, Heemyong; Jones, Kevin S.; Slinkman, Jim A.; Law, Mark E.
- 卷第78卷
- 期第6期
- 印刷ISSN0021-8979
- 文件大小1208.87KB
- 发表时间1995
- DOI10.1063/1.359944
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