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[IEEE International Electron Devices Meeting - Washington, DC, USA (10-13 Dec. 1995)] Proceedings of International Electron Devices Meeting - Effects of oxide exposure, photoresist and dopant activation on the plasma damage immunity of ultrathin oxides and oxynitrides

[IEEE International Electron Devices Meeting - Washington, DC, USA (10-13 Dec. 1995)] Proceedings of International Electron Devices Meeting - Effects of oxide exposure, photoresist and dopant activation on the plasma damage immunity of ultrathin oxides and oxynitrides

Lai, K.; Kumar, K.; Chou, A.; Lee, J.C.

作者Lai, K.; Kumar, K.; Chou, A.; Lee, J.C.
文件大小379.21KB
发表时间1995
DOI10.1109/iedm.1995.499205
页码319-322

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