Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM
Cote, D. R.; Nguyen, S. V.; Cote, W. J.; Pennington, S. L.; Stamper, A. K.; Podlesnik, D. V.
- 期刊名称IBM Journal of Research and Development
- 作者Cote, D. R.; Nguyen, S. V.; Cote, W. J.; Pennington, S. L.; Stamper, A. K.; Podlesnik, D. V.
- 卷第39卷
- 期第4期
- 印刷ISSN0018-8646
- 电子ISSN0018-8646
- 文件大小4765.80KB
- 发表时间1995-07
- DOI10.1147/rd.394.0437
- 页码437-464