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Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM

Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM

Cote, D. R.; Nguyen, S. V.; Cote, W. J.; Pennington, S. L.; Stamper, A. K.; Podlesnik, D. V.
  • 期刊名称IBM Journal of Research and Development
  • 作者Cote, D. R.; Nguyen, S. V.; Cote, W. J.; Pennington, S. L.; Stamper, A. K.; Podlesnik, D. V.
  • 卷第39卷
  • 期第4期
  • 印刷ISSN0018-8646
  • 电子ISSN0018-8646
  • 文件大小4765.80KB
  • 发表时间1995-07
  • DOI10.1147/rd.394.0437
  • 页码437-464
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