发现好书期刊，享受阅读乐趣

海量图书期刊资源，随时随地畅享阅读乐趣

Low Temperature Formation of Shallow p+n Junctions by BF[sub 2][sup +] Implantation into Thin Pd[sub 2]Si Films on Si Substrates

Low Temperature Formation of Shallow p+n Junctions by BF[sub 2][sup +] Implantation into Thin Pd[sub 2]Si Films on Si Substrates

Lin, C. T.

期刊名称Journal of The Electrochemical Society
作者Lin, C. T.
卷第142卷
期第5期
印刷ISSN0013-4651
文件大小1363.66KB
发表时间1995
DOI10.1149/1.2048616

← 返回【学霸图书馆】主页