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Generalized defect annihilation kinetics for structural relaxation in amorphous silicon

Generalized defect annihilation kinetics for structural relaxation in amorphous silicon

Shin, Jung H.; Atwater, Harry A.

期刊名称Philosophical Magazine Part B
作者Shin, Jung H.; Atwater, Harry A.
卷第72卷
期第1期
印刷ISSN1364-2812
电子ISSN1463-6417
文件大小621.11KB
发表时间1995-07
DOI10.1080/13642819508239059
页码1-11

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