S i O 2 / P o l y - S i Multilayered Electron Beam Resist Process for Fabrication of Ultrasmall Tunnel Junctions
- 期刊名称Japanese Journal of Applied Physics
- 作者Wada, Toshimi; Hirayama, Motoki; Haraichi, Satoshi; Ishii, Ken'ichi; Hiroshima, Hiroshi; Masanori Komuro, Masanori Komuro
- 卷第34卷
- 印刷ISSN0021-4922
- 电子ISSN1347-4065
- 文件大小134.53KB
- 发表时间1995-12-01
- DOI10.7567/JJAP.34.6961
The Absorption Spectra of I <sub/>2</sub> , I <sub/>3</sub><sup>-</sup> , I <sup>-</sup> , IO <sub/>3</sub><sup>-</sup> , S <sub/>4</sub> O <sub/>6</sub><sup>=</sup> and S <sub/>2</sub> O <sub/>3</sub><sup>=</sup> . Heat of the Reaction I <sub/>3</sub><sup>-</sup> = I <sub/>2</sub> + I <sup>-</sup>Awtrey, Alice D.; Connick, Robert E. · Journal of the American Chemical Society · 1951
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