Anisotropic Diffusion of Si Adsorbates on a Si(001) Surface
- 期刊名称Japanese Journal of Applied Physics
- 作者Doi, Takahisa; Ichikawa, Masakazu
- 卷第34卷
- 印刷ISSN0021-4922
- 文件大小339.41KB
- 发表时间1995-7-15
- DOI10.1143/JJAP.34.3637
- 页码3637-3641
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