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Analysis of the Resistance Degradation of
<b>
<i>S</i>
<i>r</i>
<i>T</i>
<i>i</i>
<i>O</i>
<sub/>3</sub></b>
and
<b>
<i>B</i>
<i>a</i>
<sub/><i>x</i>
</sub><i>S</i>
<i>r</i>
<sub/>
(1-
<i>x</i>
)
</sub><i>T</i>
<i>i</i>
<i>O</i>
<sub/>3</sub></b>
Thin Films

Analysis of the Resistance Degradation of S r T i O ₃ and B a _xS r _{(1-
x
)}T i O ₃ Thin Films

Numata, Ken; Fukuda, Yukio; Aoki, Katsuhiro; Nishimura, Akitoshi

期刊名称Japanese Journal of Applied Physics
作者Numata, Ken; Fukuda, Yukio; Aoki, Katsuhiro; Nishimura, Akitoshi
卷第34卷
印刷ISSN0021-4922
电子ISSN1347-4065
文件大小789.11KB
发表时间1995-9-30
DOI10.1143/JJAP.34.5245
页码5245-5249

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