SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Optical/Laser Microlithography VIII - Pattern-dependent correction of mask topography effects for alternating phase-shifting masks
- 作者Ferguson, Richard A.; Wong, Alfred K. K.; Brunner, Timothy A.; Liebmann, Lars W.; Brunner, Timothy A.
- 卷第2440卷
- 印刷ISSN0277-786X
- 文件大小880.09KB
- 发表时间1995
- DOI10.1117/12.209267
- 页码349-360
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