Applications of focused ion beams in microelectronics production, design and development

• 作者F. A. Stevie; T. C. Shane; P. M. Kahora; R. Hull; D. Bahnck; V. C. Kannan; E. David
• 卷第23卷
• 期第2期
• 印刷ISSN0142-2421
• 电子ISSN1096-9918
• 文件大小1007.13KB
• 发表时间1995
• DOI10.1002/sia.740230204
• 页码61-68