ChemInform Abstract: Deposition of Aluminum Nitride Thin Films by MOCVD from the Trimethylaluminum-Ammonia Adduct.
A. C. JONES; S. A. RUSHWORTH; D. J. HOULTON; J. S. ROBERTS; V. ROBERTS; C. R. WHITEHOUSE; G. W. CRITCHLOW
- 作者A. C. JONES; S. A. RUSHWORTH; D. J. HOULTON; J. S. ROBERTS; V. ROBERTS; C. R. WHITEHOUSE; G. W. CRITCHLOW
- 卷第27卷
- 期第42期
- 印刷ISSN0931-7597
- 电子ISSN1522-2667
- 文件大小28.11KB
- 发表时间1996
- DOI10.1002/chin.199642001