Very low temperature polycrystalline silicon films with very large grains deposited for thin film transistor applications

• 作者K.C. Wang; T.R. Yew; H.L. Hwang
• 卷第92卷
• 印刷ISSN0169-4332
• 文件大小311.08KB
• 发表时间1996
• DOI10.1016/0169-4332(95)00210-3
• 页码99-105