[IEEE 1996 IEEE Hong Kong Electron Devices Meeting - Hong Kong (29 June 1996)] Proceedings 1996 IEEE Hong Kong Electron Devices Meeting - HF wet etching of oxide after ion implantation
Lianjun Liu, ; Pey, K.L.; Pangdow Foo,
- 作者Lianjun Liu, ; Pey, K.L.; Pangdow Foo,
- 文件大小301.35KB
- 发表时间1996
- DOI10.1109/hkedm.1996.566296
- 页码17-20